Metallographic microscope is developed for the needs of LCD, semiconductor industry, silicon wafer manufacturing industry, electronic information industry, and metallurgical industry. As an advanced metallographic microscope user, it can experience its super strong performance and be widely used in the detection of semiconductors, FPDs, circuit packaging, circuit boards, materials, castings/metal/ceramic components, and precision molds. This instrument adopts two forms of illumination: reflection and transmission. Under the illumination of reflected light, it can perform light and dark field observation, DIC observation, and polarization observation. Observe the bright field under transmitted light. A stable and high-quality optical system enables clearer imaging and better contrast.
2、 Technical specifications
Observation Head: 30 ° Hinged Three Eyes (50mm-75mm)
Eyepiece: WF10 ×/ 25mm
WF10 ×/ 20mm with 0.1mm cross dividing plate
Objective: Working at infinite distances in a flat field Distance between light and dark field objective: 5 ×/ 0.1B.D/W.D.29.4mm
ten ×/ 0.25B.D/W.D.16mm, 20 ×/ 0.40B.D/W.D.10.6mm, 40 ×/ 0.60B.D/W.D.5.4mm
Converter: Four hole converter with DIC socket
Platform: Double layered mobile platform
Platform size: 189mm × 160mm
Moving range: 80mm × 50mm
Color filter: Insert plate color filter (green, blue, neutral)
Spotlight mirror: N A. 1.25 Abbe condenser with variable aperture and filter
Focusing: Coarse and micro coaxial focusing, using gear and rack transmission mechanism. Micro grid value is 0.002mm
Light source: Transmission lighting: Halogen lamp 12V/50W, AC85V-230V, brightness adjustable
Fallout lighting: equipped with aperture light bars and field of view light bars, halogen lamp 12V/50W, AC85V-230V, adjustable brightness
Polarization device: The polarizing mirror can rotate 360 degrees, and both the polarizing mirror and the polarizing mirror can be moved out of the optical path
Testing tool: 0.01mm measuring ruler
Attachment available: 2D measurement software
Professional metallographic image analysis software
Fallout lighting: halogen lamp 12V/100W, AC85V-230V, adjustable brightness
Flat field infinitely long working distance light and dark field objective: 50 ×/ 0.55B.D/W.D.5.1mm
eighty ×/ 0.75B.D/W.D.4mm, 100 ×/ 0.80B.D/W.D.3mm
Micrometer eyepiece
1.3 million, 2 million, 3 million, and 5 million pixel CMOS electronic eyepieces
Photography device and CCD interface 0.5 ×、 zero point five seven ×、 zero point seven five ×
DIC (10 ×、 twenty ×、 forty ×、 one hundred ×）
Flattening machine
Color 1/3 inch CCD 520 lines
3、 Explanation of the characteristics of differential interference microscopy
1. The differential interference microscope adopts the objective imaging technology of UIS high-resolution, long working distance infinite optical path correction system.
2. Expanded the reuse technology of objective lenses, making them compatible with all observation methods including light and dark field of view, polarization, DIC, and providing high-definition image quality in each observation method.
3. The differential interference microscope uses non spherical Kohler illumination to increase observation brightness.
4. WF10 × （ Φ 25) Ultra large field of view eyepiece, long working distance light and dark field metallographic objective.
5. A converter that can be inserted into DIC differential interference devices.
